Push plate tunnel furnace
Push plate tunnel furnace product description
This type of furnace is mainly used for the integral sintering process of PTC, MLCC and other electronic components, ceramic rings, ceramic phone cases, inductive powders and NFC magnetic ferrite plates, as well as for the heat treatment of electronic parts.
Push plate tunnel furnace features:
Operating temperature: RT ~ 1 00 ℃, RT ~ 1 400 ℃ and RT ~ 1600 ℃.
The heat insulation material is made of imported energy-saving light foam brick, with high strength and no falling off of slag.
Unique large dome structure: good stability, uniform furnace temperature, good product consistency.
Classic screw drive mechanism: stable thrust, no climbing and shaking.
Full automatic rotation operation; PLC control: reliable operation.
Temperature control method is to control silicon automatic regulation voltage, and with soft start, soft off, constant current/constant voltage and other functions.
Temperature controller: high precision, relatively fast, stable control.
Computer integrated control system.
Push plate tunnel furnace of technical parameters
Size of push board
Control temperature zone
KTL resistance wire/silicon carbide bar/ molybdenum silicide bar
Range of belt speed
40-200mm/min, variable-frequency electrodeless speed governing, digital display
reference of the Pusher plate board tunnel furnace , Push Plate Furnace